The MoS2/Ti composite films were deposited on SKD-11 steel and Si wafer by D.C, magnetron sputtering. The titanium content of the films increases with the Ti target current increasing according to EPMA. The FE-SEM result confirms that the film morphology is composed of the columns with the size of nano-meter, and more compact and hard at a higher Ti target current.
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李永良 Kin Sunkyu. MoS2／Ti复合膜的制备和性能[J].稀有金属材料与工程,2006,35(8):1308~1310.[Li Yongliang, Kin Sunkyu. Preparation and Performance of MoS2/Ti Composite Films[J]. Rare Metal Materials and Engineering,2006,35(8):1308~1310.] DOI：[doi]