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复合电沉积Ni-MWCNTs及镍电结晶的研究
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国家自然科学基金资助(20576126);河南省自然科学基金资助(072300420010)


Composite Electrodeposit of Ni-MWCNTs and the Electrocrystallization of Nickel
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    摘要:

    研究了水平阴极方式复合电沉积Ni-MWCNTs(Ni-多壁碳纳米管)。采用硫酸镍基础电解液,添加适当表面活性剂和光亮剂,MWCNTs为2~2.5 g/L,电流密度为2.5 A/dm2时,获得的Ni-MWCNTs沉积层结构致密,复合沉积层中MWCNTs含量达22.45%。复合电沉积层表面微观形貌照片显示,MWCNTs在复合电沉积层中占主要体积,镍的电结晶形态呈球形,结晶点位置位于MWCNTs管壁缺陷处及部分管端处,MWCNTs的管端和管壁缺陷处的Ni晶粒相互连接,形成牢固的复合沉积层。复合电沉积层中MWCNTs含量受电解液中MWCNTs浓度、电流密度以及光亮剂影响,在MWCNTs上的Ni沉积层连续性直接受MWCNTs管壁上缺陷的数量和连续性影响,形成晶核的缺陷尺度至少在1 nm以上

    Abstract:

    Multiwall carbon nanotubes (MWCNTs) were prepared by composite electrodeposit in a horizontal cathode mode. The electrodeposited MWCNTs have dense structure with a MWCNTs content of 22.45 % when using sulfuric nickel electrolyte, surface active solvent and brightener in a MWCNT content of 2~2.5 g/L and a voltaic density of 2.5 A/dm2. The SEM results show that the MWCNTs occupy the main volume of composite electrodepositing coating with sphere morphology for the Ni electrocrystallization. The crystallization occurs on the sunken part and the top of tubes where the Ni grains are connected each other to form a solid composite electrodeposits connecting the MWCNTs matrix and crystals. The MWCNTs content of composite electrodeposition are dominated by the MWCNTs concentration, the voltaic density and the brightener, while the connection of nickel deposition layer is dominated by the defects number and the connection of MWCNTs, and the shortest length of defect should be 1 nm at least for nucleation

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冯 辉,张 勇,卫应亮,陈俭民,崔亚锋,张天记,冯少彬.复合电沉积Ni-MWCNTs及镍电结晶的研究[J].稀有金属材料与工程,2009,38(2):229~232.[Feng Hui, Zhang Yong, Wei Yingliang, Chen Jianmin, Cui Yafeng, Zhang Tianji, Feng Shaobin. Composite Electrodeposit of Ni-MWCNTs and the Electrocrystallization of Nickel[J]. Rare Metal Materials and Engineering,2009,38(2):229~232.]
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  • 收稿日期:2008-01-23
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