章德玉,刘伟生.用于溅射靶材的高纯钌粉的制备工艺初步研究[J].稀有金属材料与工程,2016,45(5):1353~1356.[zhangdeyu, liuweisheng. Preliminary Study on the Process for Producing High-Purity Ruthenium used for sputtering target[J]. Rare Metal Materials and Engineering,2016,45(5):1353~1356.]
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