The pure vanadium metal thin films were fabricated on the SnO2 doped F conductive glass（FTO） substrates by DC magnetron sputtering at room temperature, then the VO2 /FTO composite films were prepared by annealing process in a mixture of N2 and O2. The structure and optical-electrical properties of the composite films were analyzed by instruments. AFM results show that the crystallinity of the thin film is improved significantly with smooth and uniform surface morphology. Results show that VO2 /FTO composite films do not change the preferred orientation growth of VO2 thin films, but significantly change its surface morphology characteristics. Compared with the VO2 thin films that the phase transition temperature of the VO2 /FTO composite films is decreased about 20℃, the width of thermal hysteresis is narrowed by about 5℃, and the infrared transmittances before and after phase transition are 45% and 22% respectively. The resistivity variation is up to three orders of magnitude before and after transition. This brings about many new opportunities for optoelectronic devices and industrial production.