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Study of Ta-doped CeO2 Buffer Layer for Coated Conductors
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Study of Ta-doped CeO2 Buffer Layer for Coated Conductors
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    摘要:

    采用简单的金属有机物沉积方法在自制的Ni-5W基带上成功地制备了Ta掺杂CeO2过渡层。XPS结果表明:在热处理时的还原性气氛中,Ta5+优先于Ce4+被还原为Ta4+,这有利于减少或抑制由于Ce4+被还原而产生的裂纹和孔洞。XRD结果表明除CeO2的衍射峰稍变小外,没有发现新的物相生成,这说明Ta4+部分取代了CeO2晶格中Ce4+的位置生成了Ce0.75Ta0.25O2. Ce0.75Ta0.25O2 的ω-扫描和j-扫描半高宽带分别是 4.38o和 6.67o,这表明Ce0.75Ta0.25O2具有良好的面外和面内织构。AES结果表明单层Ce0.75Ta0.25O2的厚度大约为70 nm,在过渡层的表面没有检测到Ni元素,说明该过渡层具有很好的阻止元素扩散的能力。综上说明,Ta掺杂的CeO2过渡层有望成为涂层导体用单层多功能过渡层。

    Abstract:

    Ta-doped CeO2 buffer layers were grown on the home-made textured Ni-5W substrates for YBCO coated conductors by a simple metal-organic deposition technique. The characterization of the samples was discussed. XPS results indicate that Ta5+ is reduced into Ta4+ prior to Ce4+, which is helpful to suppress the formation of holes and cracks in CeO2 films from reducing Ce4+ into Ce3+. Additionally, no new phase is found by doping Ta into CeO2, which indicates that Ta4+ replaces the Ce4+ position in CeO2 lattice to form Ce0.75Ta0.25O2. The Ce0.75Ta0.25O2 has a good out-of-plane and in-plane texture FWHM values for ω scan and j scan are 4.38o and 6.67o, respectively. AES measurements show that no Ni element is detected on the surface of Ce0.75Ta0.25O2 film, and a one-layer film has a thickness of about 70 nm. It is promising that the presently developed Ce0.75Ta0.25O2 film can be used as a single multi-functional buffer layer for coated conductor.

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刘 敏,吕 昭,徐 燕,叶 帅,索红莉. Study of Ta-doped CeO2 Buffer Layer for Coated Conductors[J].稀有金属材料与工程,2014,43(6):1329~1331.[Liu Min, Lü Zhao, Xu Yan, Ye Shuai, Suo Hongli. Study of Ta-doped CeO2 Buffer Layer for Coated Conductors[J]. Rare Metal Materials and Engineering,2014,43(6):1329~1331.]
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  • 收稿日期:2013-06-15
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  • 在线发布日期: 2014-11-13
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