The nanocrystalline Ti films were deposited by the method of physical vapor deposition in high pulse electric field, the grain size of which was obtained by a sharp increase in the peak current to investigate the effects of the films growth mode and mechanical properties. The results show that the larger peak current could obtained the small grain size but cannot change the crystal surface preferential growth of Ti (100) crystal in the films. However, the film surface morphology showed the increase of the particle aggregation size and greatly reduce of the particle clearance while the peak current increased, the whole structure is showing a spherical close growth. The shape of the cross section of the film growth morphology is gradually changed from the fiber to columnar shape, and it can effectively reduce the film defects and increase the density with the increase of peak current. The hardness and modulus of the films increased firstly and then decreased with the increase of the peak current, the highest value appeared between 30A-45A of the peak current.