1.中国科学院金属研究所专用材料与器件研究部;2.深圳职业技术学院;3.俄罗斯科学院西伯利亚分院强流电子研究所
TB43
国家自然科学基金项目(面上项目,重点项目,重大项目)
1.Institute of Metal Research,Chinese Academy of Sciences;2.School of Mechanical and Electrical Engineering,Shenzhen Polytechnic;3.Institute of High Current Electronics,Siberian branch,Russian Academy of Sciences,Akademicheskii pr /
赵彦辉,赵升升,任玲,V. V. Denisov, N. N. Koval,杨柯,于宝海.基体脉冲偏压对TiN/Cu纳米复合薄膜组织结构、力学及耐磨性能的影响[J].稀有金属材料与工程,2018,47(11):3284~3288.[Yanhui Zhao, Shengsheng Zhao, Ling Ren, V. V. Denisov, N. N. Koval, Ke Yang, Baohai Yu. Effect of substrate pulse bias voltage on the microstructure and mechanical and wear-resistant properties of TiN/Cu nanocomposite films[J]. Rare Metal Materials and Engineering,2018,47(11):3284~3288.]
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