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基体脉冲偏压对TiN/Cu纳米复合薄膜组织结构、力学及耐磨性能的影响
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1.中国科学院金属研究所专用材料与器件研究部;2.深圳职业技术学院;3.俄罗斯科学院西伯利亚分院强流电子研究所

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TB43

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国家自然科学基金项目(面上项目,重点项目,重大项目)


Effect of substrate pulse bias voltage on the microstructure and mechanical and wear-resistant properties of TiN/Cu nanocomposite films
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1.Institute of Metal Research,Chinese Academy of Sciences;2.School of Mechanical and Electrical Engineering,Shenzhen Polytechnic;3.Institute of High Current Electronics,Siberian branch,Russian Academy of Sciences,Akademicheskii pr /

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    摘要:

    本文采用轴向磁场增强电弧离子镀在高速钢基体上沉积了TiN/Cu纳米复合薄膜,研究了基体脉冲偏压幅值对薄膜成分、结构、力学性能及耐磨性能的影响。结果表明,薄膜中铜含量随着脉冲偏压幅值的增加先增加而后降低,在一个较低的范围内(1.3-2.1at.%)。X射线衍射结果表明所有的薄膜均出现TiN相,并未观察到Cu相。薄膜的择优取向随着脉冲偏压幅值的增加而改变。薄膜的最高硬度为36GPa,是在脉冲偏压幅值为-200V时得到的,对应了1.6at.%的Cu含量。与纯的TiN薄膜相比,Cu的添加明显增强了薄膜的耐磨性能。

    Abstract:

    In this present work, TiN/Cu nanocomposite films were deposited by axial magnetic field-enhanced arc ion plating (AMFE-AIP) on high-speed steel (HSS) substrates, and the effect of substrate bias voltage on the chemical composition, microstructure, mechanical and tribological properties of the films were investigated by X-ray photoelectrons spectroscopy (XPS), X-ray diffraction (XRD), nanoindentation and wear measurements, respectively. The results showed that Cu content firstly increases and then decreases with the increase of the pulse bias voltage, being a low value in the range of 1.3 to 2.1 at.%. The XRD results showed all the films only appear TiN phase and no Cu phase is observed. And the preferred orientation for the films changes significantly with increasing the pulse bias voltage. The maximum value of hardness, 36 GPa is obtained with pulse bias voltage of -200V corresponding to the film containing approximately 1.6 at.% Cu. Compared to pure TiN film, Cu addition to TiN films significantly improves the wear resistance.

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赵彦辉,赵升升,任玲,V. V. Denisov, N. N. Koval,杨柯,于宝海.基体脉冲偏压对TiN/Cu纳米复合薄膜组织结构、力学及耐磨性能的影响[J].稀有金属材料与工程,2018,47(11):3284~3288.[Yanhui Zhao, Shengsheng Zhao, Ling Ren, V. V. Denisov, N. N. Koval, Ke Yang, Baohai Yu. Effect of substrate pulse bias voltage on the microstructure and mechanical and wear-resistant properties of TiN/Cu nanocomposite films[J]. Rare Metal Materials and Engineering,2018,47(11):3284~3288.]
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历史
  • 收稿日期:2017-04-19
  • 最后修改日期:2017-08-21
  • 录用日期:2017-09-11
  • 在线发布日期: 2018-12-19
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