+高级检索
Si对Hastelloy N合金氧化行为的影响
作者:
作者单位:

1.中国科学院上海应用物理研究所;2.重庆交通大学机电与汽车工程学院

作者简介:

通讯作者:

中图分类号:

TG146.1+5

基金项目:

国家自然科学基金资助(项目号51674237);超轻材料与表面技术教育部重点实验室


Effects of silicon on the oxidation behavior of Hastelloy N superalloy at 850℃
Author:
Affiliation:

1.Shanghai Institute of Applied Physics,Chinese Academy of Sciences;2.School of Mechanotronics Vehicle Engineering,Chongqing Jiaotong University

Fund Project:

  • 摘要
  • |
  • 图/表
  • |
  • 访问统计
  • |
  • 参考文献
  • |
  • 相似文献
  • |
  • 引证文献
  • |
  • 资源附件
  • |
  • 文章评论
    摘要:

    利用不连续增重法,研究了不同Si含量的Hastelloy N合金850℃恒温氧化行为。结果表明随Si含量的增加,氧化动力学曲线保持抛物线规律。氧化100h后,氧化膜出现分层现象,最外层均为NiO、NiFe2O4等复合氧化物,中间层为Cr2O3、MoO2等氧化物。由于在氧化层与基体界面处形成连续致密的SiO2层,有效阻止Cr离子向外扩散进入氧化层,促进Hastelloy N合金中间层形成较为致密的Cr2O3氧化层,提高了合金的抗氧化性能。

    Abstract:

    The isothermal oxidation behavior of Hastelloy N superalloy with different silicon contents in air at 850℃ were investigated by using discontinuous increasing weight method. The results showed that oxidation mass gain kinetics of the samples follow the parabolic law. It was observed that the surfaces of the alloys exhibited a multi-layer structure after 100h oxidation. The outer oxide flim of Hastelloy N superalloy mainly consists of NiO, NiFe2O4and other oxide composites. The middle layer is confirmed to be Cr2O3 and MoO2. Since a continuous and dense SiO2 sublayer is formed at the metal-oxide interface, it is effective to prevent Cr diffusion. The addition of Si promotes the formation of a relatively continuous and compact Cr2O3 and it can strongly improve the oxidation resistance.

    参考文献
    相似文献
    引证文献
引用本文

郭伟杰,李建树,陆燕玲,张继祥,周兴泰. Si对Hastelloy N合金氧化行为的影响[J].稀有金属材料与工程,2019,48(3):885~891.[Guo Weijie, Li Jianshu, Lu Yanling, Zhang Jixiang, Zhou Xingtai. Effects of silicon on the oxidation behavior of Hastelloy N superalloy at 850℃[J]. Rare Metal Materials and Engineering,2019,48(3):885~891.]
DOI:10.12442/j. issn.1002-185X.20170712

复制
文章指标
  • 点击次数:
  • 下载次数:
  • HTML阅读次数:
  • 引用次数:
历史
  • 收稿日期:2017-08-11
  • 最后修改日期:2017-10-14
  • 录用日期:2017-11-09
  • 在线发布日期: 2019-04-10
  • 出版日期: