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脉冲周期对黄金电沉积层的影响
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1.中国地质大学武汉珠宝学院;2.武汉工程科技学院

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中国地质大学(武汉)珠宝检测技术创新中心开放基金(CJHIXM-S201615)


Influence of Pulse Period of Bidirectional Pulse Electrodeposition Process on the Properties of Electroformed Layer of Gold
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1.China University of Geosciences,Gemmological Institution;2.Wuhan University of Engineering Science,School of Jewellery

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    摘要:

    在无氰黄金电沉积工艺的基础上,利用双向脉冲电源,经过十个小时的电沉积可以得到质量较好的黄金样品。以脉冲周期为单一变量,通过单一变量试验,利用扫描电镜、X射线衍射仪以及维氏硬度计探讨了黄金电沉积层的微观形貌、平均晶粒尺寸以及维氏硬度值。结果显示当脉冲周期为45ms到75ms范围内时,电沉积层的维氏硬度值可以达到117.0HV0.1,且电沉积层具有较强的(111)晶面的择优取向。较强的(111)晶面择优取向伴随着电沉积层更加平整的微观形貌以及更高的维氏硬度值。。

    Abstract:

    Electroformed gold layers were prepared by bidirectional pulse electrodeposition process, with thickness up to 150μm in 20h from cyanide-free bath. Through single variable experiment, which the pulse period was treated as a single variable, we studied the effect of pulse period on the properties of electroformed layer of gold using bidirectional pulse power. Scanning Electron Microscopy, X-ray Diffraction, and Vickers hardness test were used to research the surface mophology, average crystal size and hardness of electroformed gold layers. Results showed the microhardness of electroformed layer of gold is higher when pulse period changes between 45ms and 75ms, which can reach to 117HV0.1. Strong (111) preferred orientation can result in more flat micro surface and higher micohardness of electroformed gold layers.

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郑利珊,袁心强,雷婷.脉冲周期对黄金电沉积层的影响[J].稀有金属材料与工程,2019,48(6):1797~1802.[Zheng Lishan, Yuan Xinqiang, Lei Ting. Influence of Pulse Period of Bidirectional Pulse Electrodeposition Process on the Properties of Electroformed Layer of Gold[J]. Rare Metal Materials and Engineering,2019,48(6):1797~1802.]
DOI:10.12442/j. issn.1002-185X.20171046

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  • 收稿日期:2017-11-19
  • 最后修改日期:2018-03-15
  • 录用日期:2018-08-31
  • 在线发布日期: 2019-07-30
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