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双级HPPMS靶电流对TiN镀层微观结构及耐蚀性的影响
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西安理工大学材料科学与工程学院

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This work was supported by National Natural Science Foundation of China (Grant No.51271144).


Effect of target current of dual-stage HPPMS on the microstructure and corrosion resistance of TiN coatings
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Xi’an University of Technology,Xi’an

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Micro-arc ion plating environment building and study of leave-target mechanism and deposition action of plating material particle

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    摘要:

    高功率脉冲磁控溅射(HPPMS)利用较高的脉冲峰值靶功率密度(如:1-3kW/cm2)获得高密度的等离子体,可提高TiN镀层的微观结构和力学性能。然而,HPPMS技术的主要缺点是平均沉积速率较低,增加了镀层的制备成本。为了解决传统HPPMS平均沉积速率低的问题,研究提出一种新型的双级HPPMS技术,即在一个脉冲周期内具有两个连续的、独立可调的脉冲阶段。通过对双级HPPMS电场的合理调配,可制备得到结构致密的TiN镀层,研究了双级HPPMS靶电流对TiN镀层微观结构及耐蚀性的影响。结果表明,当靶电流增大至20A时,靶面形貌由小凹坑转变为大面积凹坑,说明镀料粒子的脱靶方式由碰撞溅射转变为升华或蒸发。同时,当靶电流为10A时,镀层颗粒呈现三棱锥状结构,平均晶粒尺寸为11nm;当靶电流增大至25A时,镀层颗粒呈现光滑致密的圆胞状结构,平均晶粒尺寸为18nm,光滑致密的组织结构使镀层具有较好的耐蚀性。

    Abstract:

    High power pulsed magnetron sputtering (HPPMS) improves microstructure and mechanical properties of TiN coating by high density plasma using a pulsed high peak target power density (e.g. 1-3 kW/cm2). However, the low average deposition rate increases preparation cost of coating, which becomes a downside of HPPMS technique. A dual-stage HPPMS technique, which has two continuous and independently adjustable steps in one pulse period, is developed in order to solve low deposition rate of traditional HPPMS. Through the reasonable allocation of electric field of dual-stage HPPMS, a fine and dense structure of TiN coating is prepared. The effects of target current of dual-stage HPPMS on the microstructure and corrosion resistance of TiN coating are studied. It was found that the morphology of target surface changed from small pits to large-area craters when target current increased to 20 A. It indicated that the leave-target mode of deposited particles changed from sputtering to sublimation or evaporation. Additionally, when target current was 10 A, the TiN coating exhibited a pyramid shape particles with average grain size of 11 nm. When target current increased to 25 A, the TiN coating showed a circular shape particles with average grain size of 18 nm and dense columnar structure. This microstructure gave rise to a better corrosion resistance.

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郝娟,蒋百灵.双级HPPMS靶电流对TiN镀层微观结构及耐蚀性的影响[J].稀有金属材料与工程,2020,49(9):2991~2996.[Hao Juan, JIANG Bailing. Effect of target current of dual-stage HPPMS on the microstructure and corrosion resistance of TiN coatings[J]. Rare Metal Materials and Engineering,2020,49(9):2991~2996.]
DOI:10.12442/j. issn.1002-185X.20200093

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  • 收稿日期:2020-02-16
  • 最后修改日期:2020-04-14
  • 录用日期:2020-04-17
  • 在线发布日期: 2020-10-15
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