The structure and properties of nanocrystalline TiN films deposited by direct current magnetron sputtering (dcMS), high power pulsed magnetron sputtering (HPPMS) and modulated pulsed power magnetron sputtering (MPPMS) were compared. Results show that columnar structure with a few gaps is obtained through dcMS because of low ionization rate and low kinetic energy of sputtered species, which results in poor mechanical properties; the deposition rate is 51 nm/min. The TiN film deposited by HPPMS exhibits dense structure and smooth surface, which is because HPPMS can improve ionization rate of sputtered species under the conditions of high peak target power and low duty cycle. The mechanical properties are improved, but the average deposition rate is relatively low, only 25 nm/min. MPPMS has the capability to modulate peak target power and duty cycle to achieve high ionization degree and deposition rate. Thus, the TiN film deposited by MPPMS shows dense columnar structure, smooth surface, superior mechanical properties and enhanced deposition rate of 45 nm/min.