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纳米晶体Ti表面磁控溅射SiC薄膜的干摩擦学性能
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江苏大学优秀学术青年骨干培养对象基金(1211110001);江苏省教育厅摩擦学重点实验室基金(Kjsmcx06005)


Dry Tribological Properties of Magnetron Sputtered SiC Films on Nanocrystalline Titanium Substrate
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    摘要:

    采用室温磁控溅射技术在纳米晶体钛(剧烈塑性变形制备)表面制备出碳化硅(SiC)薄膜,研究SiC薄膜的组织结构、纳米压痕行为和摩擦磨损性能。结果表明:SiC薄膜具有纳米尺度“畴”特征的表面形貌、高含量Si-C键、与基材间具有明显且呈梯度的元素扩散、低的纳米硬度(10.62 GPa)、低的弹性模量(83.34 GPa)和高的硬模比(0.128)。在1.96 N载荷、氮化硅球(半径为2 mm)为对摩件、室温空气条件下,其磨损速率为10-5?mm3·m-1·N-1级、摩擦系数约为0.162,磨损后薄膜不出现裂纹和剥落。

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    SiC (carbon nitride) thin films were deposited on nanocrystalline titanium substrate (produced by severe plastic deformation) by magnetron sputtering technique at room temperature. The microstructure, nano-indentation and friction/wear properties of the SiC films were investigated. The results show that the SiC films are of nano-scale domain features for surface morphology, a large amount of Si-C bonds, good adhesion (with obvious and gradual film-substrate element diffusions as well as small film-substrate elastic modulus difference), low nano-hardness (10.62 GPa), low Young's modulus (83.34 GPa) and high hardness-to-modulus ratio (0.128). When sliding against Si3N4 ball (2 mm in radius) under room-temperature air condition and 1.96 N load, the SiC films exhibit the friction coefficient of about 0.162, and the special wear rate in the magnitude order of 10-5 mm3·m-1·N-1 with no film cracking and interface delaminating.

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许晓静,郝欣妮,陆树显,卓刘成,夏登福.纳米晶体Ti表面磁控溅射SiC薄膜的干摩擦学性能[J].稀有金属材料与工程,2011,40(6):991~994.[Xu Xiaojing, Hao Xinni, Lu Shuxian, Zhuo Liucheng, Xia Dengfu. Dry Tribological Properties of Magnetron Sputtered SiC Films on Nanocrystalline Titanium Substrate[J]. Rare Metal Materials and Engineering,2011,40(6):991~994.]
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  • 收稿日期:2010-07-01
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