Vanadium films were fabricated on industrial pure aluminum using High Power Pulsed Magnetron Sputtering (HPPMS). The influences of DC bias on phase structure, surface morphology, and especially the corrosion resistance of vanadium films after annealed at different temperatures have been investigated. XRD patterns show the highest intensity of V(111) preferential orientation. The surface of vanadium films was smooth and flat with a maximum roughness of 0.488 nm. The surface roughness decreased with increasing bias and increased if the bias further increased. The deposition rate decreased and increased with increasing sample bias. The reason is that ion attracting effect and sputtering effect competed in the deposition process. The sample treated at –100 V possessed the best corrosion resistance with the corrosion potential increased by 0.425 V and the corrosion current decreased by two orders of magnitude compared with the substrate. The samples exhibited much better corrosion resistance after annealing. The corrosion current of the samples annealed at 200 °C decreased by an order of magnitude compared with the substrate. The corrosion resistance of vanadium films increased less obviously compared with the substrate after annealing at 300 °C