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Preparation of Nano-SnO2 Abrasives and Their Application in Chemical Mechanical Polish of Ruthenium
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Preparation of Nano-SnO2 Abrasives and Their Application in Chemical Mechanical Polish of Ruthenium
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National Natural Science Foundation of China (50975002); Innovation Team Project of AHUT (TD201204); The Research Project for University Personnel Returning from Overseas Sponsored by the Ministry of Education of China

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    摘要:

    利用固相反应法制备纳米二氧化锡磨料并研究了制备条件对平均粒径的影响。结果表明,在500 ℃/4 h条件下制得的纳米二氧化锡粉体在水中有良好的分散性和稳定性。利用自制的抛光液对高纯钌片进行化学机械抛光,与二氧化硅磨料抛光液比较,材料去除速率和表面粗糙度都降低。当抛光液中含1%(质量分数,下同)二氧化锡、1%过硫酸铵、1%酒石酸和3 mmol/L咪唑,pH=8.0,抛光压力为17.24 kPa时,材料去除速率(MRR)和表面粗糙度(Ra)分别为6.8 nm/min和4.8 nm。

    Abstract:

    SnO2 abrasives were prepared by solid-state reaction and the effect of the preparation conditions on the average particle size of SnO2 suspension was investigated. The result manifests that the suspension prepared from SnO2 powder obtained by calcining at 500 °C for 4 h has good dispersion and good stability. CMP (chemical mechanical polish) experiments were performed on high purity Ru by home-made slurry. The MRR (material removed rate) and the roughness of the surface decrease compared with SiO2 slurry. The results reveal that MRR can reach 6.8 nm/min under the following conditions: the main constituents in slurry are 1 wt% SnO2, 1 wt% (NH4)2S2O8, 1 wt% tartaric acid and 3 mmol/L imidazole, the pH value is 8.0, the down force is 17.24 kPa; the roughness Ra is 4.8 nm under these conditions.

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储向峰,李秀金,董永平,乔红斌,白林山. Preparation of Nano-SnO2 Abrasives and Their Application in Chemical Mechanical Polish of Ruthenium[J].稀有金属材料与工程,2013,42(4):692~695.[Chu Xiangfeng, Li Xiujin, Dong Yongping, Qiao Hongbin, Bai Linshan. Preparation of Nano-SnO2 Abrasives and Their Application in Chemical Mechanical Polish of Ruthenium[J]. Rare Metal Materials and Engineering,2013,42(4):692~695.]
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  • 收稿日期:2012-04-27
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