袁亮.哈氏C-2000合金在等温氧化时第二相沉淀析出行为[J].稀有金属材料与工程,2016,45(1):28~31.[yuanliang.Precipitation behavior of second phases during isothermal oxidation of Hastelloy C-2000 alloys[J].Rare Metal Materials and Engineering,2016,45(1):28~31.]
哈氏C-2000合金在等温氧化时第二相沉淀析出行为
投稿时间:2013-12-24  修订日期:2014-03-03
中文关键词:  氧化  富Mo相  Mo3Ni3C型碳化物  晶界  电极电位
基金项目:
中文摘要:
      研究了哈氏C2000合金在800℃100h空气中等温氧化后合金基体中第二相的沉淀行为。氧化后基体中析出了富Mo相,可确定该富Mo相为具有金刚石结构的Mo3Ni3C型碳化物。富Mo相沿晶界和晶内分别呈现出非连续和连续条状形貌特征。然而,经深腐蚀后,晶内和晶界处形貌均发生了变化,即,沿晶界出现了大量白色絮状物,晶内则出现了具有金刚石结构的腐蚀坑。由于富Ni和富Cr区域具有更负的电极电位,因而使得这些区域在深腐蚀后更易被侵蚀。
Precipitation behavior of second phases during isothermal oxidation of Hastelloy C-2000 alloys
英文关键词:Oxidation, Mo-rich phases, Mo3Ni3C type carbides, Grain boundaries, Potential
英文摘要:
      The precipitation behavior of second phases in Hastelloy C-2000 alloy matrix was studied after isothermal oxidation at 800 oC for 100 h in air. Mo-rich phases were precipitated in the alloy matrix after oxidation. It is determined that Mo-rich phases with diamond cubic structure are Mo3Ni3C type carbides. Morphology characteristics of Mo-rich phases with both no-continuous irregular strip and continuous were presented along grain boundaries and in matrix, respectively. However, some variation of morphologies will take place at both grain and grain boundaries after deep etching, i.e., a large number of white flocculent structure were distributed along grain boundaries, and corrosion pits with a diamond structure appear in intragranular. Areas of Ni and Cr-rich are more easily corroded during deep etching due to a more negative electrode potential in areas.
作者单位E-mail
袁亮 西北工业大学 凝固技术国家重点实验室 yuanliang031@163.com 
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