The composite TiAlCN films were deposited by vacuum arc ion plating on GCr15 rings at 175 oC. The properties of the films were characterized by SEM,?EPMA,?XRD,?adhesion?tester,?nano-hardness?tester and UMT-2 high temperature tribometer. The results indicate that the surface of the films is smooth and dense without any obvious pores. There are a certain number of droplets on the surface of films. The thickness of the films is about 2 μm. The fcc structure of TiN is found in the films. The grain size of the films is from 10 to 30 nm. With the addition of C element into the film, (Ti0.5,Al0.5)N peak in XRD patterns appears in width. After adding C into TiAlN, the adhesion of the films declines. However, the adhesion increases slightly along with the increase of the C content, but Al and Ti ratio does not change significantly. Besides, the hardness and elastic modulus increase first and then decreases, and the friction coefficient is always declined