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Effect of Carbon Target Current on the Microstructure of Cp/AlSn Films Deposited via Magnetron Sputtering
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Effect of Carbon Target Current on the Microstructure of Cp/AlSn Films Deposited via Magnetron Sputtering
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Industrialization Project of Education Department of Shaanxi Province (2012JC13); Shaanxi Photoelectric Functional Materials and Devices Laboratory Open Fund (ZSKJ201416);

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    摘要:

    采用非平衡磁控溅射离子镀技术,当碳靶电流在0.2~.0.8 A范围,在AlZn4.5Mg 轴承合金和单晶硅Si (100) 表面制备Cp/AlSn复合镀层。通过X射线衍射(XRD),扫描电子显微镜(SEM)以及X射线光电子能谱(XPS)分别对复合镀层的相组成,微观形貌及化学态进行表征。结果表明:复合镀层为等轴晶结构;其相组成主要为均匀分布的铝、锡和碳3种相;X射线光电子能谱分析表明,在Cp/AlSn复合镀层中,铝和锡2种元素主要以单质形态存在,碳元素以sp2 和 sp3 2种杂化形式存在,其中以sp2杂化为主

    Abstract:

    Cp/AlSn composite coatings were deposited with 0.2 A to 0.8 A carbon target current on a bearing alloy and single crystal Si (100) wafer via unbalanced magnetron sputtering. X-ray diffraction (XRD), scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) were used to characterize the phase compositions, the morphologies and the chemical states of the deposited films, respectively. Results show that the composite coating has equiaxed crystal. The phases of Cp/AlSn films consist of homogeneously mixed aluminum, tin and carbon. The XPS spectrum of the deposited Cp/AlSn films confirms that aluminum and tin exist mainly in the form of pure metals, and carbon element is composed of sp2 and sp3 bonds, among which sp2 is the main bond

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郭巧琴,李建平,郭永春. Effect of Carbon Target Current on the Microstructure of Cp/AlSn Films Deposited via Magnetron Sputtering[J].稀有金属材料与工程,2015,44(8):1857~1861.[Guo Qiaoqin, Li Jianping, Guo Yongchun. Effect of Carbon Target Current on the Microstructure of Cp/AlSn Films Deposited via Magnetron Sputtering[J]. Rare Metal Materials and Engineering,2015,44(8):1857~1861.]
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  • 收稿日期:2014-07-14
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  • 在线发布日期: 2016-02-25
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