郑明珉,谭成文,于晓东,李颖,马红磊.NbF5前驱体化学气相沉积铌涂层的生长动力学[J].稀有金属材料与工程,2018,47(1):187~190.[Zheng Mingmin,Tan Chengwen,Yu Xiaodong,Li Ying,Ma Honglei.Growth kinetics of niobium coating prepared by CVD from NbF5[J].Rare Metal Materials and Engineering,2018,47(1):187~190.]
NbF5前驱体化学气相沉积铌涂层的生长动力学
投稿时间:2015-11-11  修订日期:2016-05-17
中文关键词:  铌涂层,化学气相沉积, 生长动力学, 副产物
基金项目:国家自然科学基金(51071099; 51171101);上海市教委科研创新基金(13YZ015)
中文摘要:
      采用常压化学气相沉积方法在1150℃下成功制备了组织致密的金属铌涂层,沉积速率达到了250μm/h。通过对沉积后沿进气方向涂层厚度分析,确定了不同位置NbF5、H2、HF及Ar的摩尔百分比,对数据进行拟合获得了与实验结果吻合较好生长动力学方程。进一步分析动力学方程可知副产物HF对于沉积速率影响较大而Ar几乎没有影响。
Growth kinetics of niobium coating prepared by CVD from NbF5
英文关键词:Niobium  coating, chemical  vapor deposition, growth  kinetics, byproducts
英文摘要:
      :Dense niobium coating was successfully prepared by atmospheric pressure chemical vapor deposition(CVD) method at 1150,which reached 250μm / h deposition rate. Analysis the post-deposition coating thickness by the gas flow direction,the mole percentage of NbF5, H2, HF and Arin different positionsweredetermined. And got agrowthkinetics equation which agrees well with the experimental results . Further analysis of the kinetic equations showed that the byproduct HF has a greater impact on deposition rate and Ar almost no effect.
作者单位E-mail
郑明珉 北京理工大学 15210619204@163.com 
谭成文 北京理工大学  
于晓东 北京理工大学 yuxiaodong.bit@163.com 
李颖 北京理工大学  
马红磊 中国航天员科研与训练中心  
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