张腾,戴少涛,马韬,胡磊,王邦柱.反应动力学法评价MOCVD过程中金属有机盐的稳定性[J].稀有金属材料与工程,2019,48(12):3824~3828.[Teng Zhang,Shaotao Dai,Tao Ma,Lei Hu,Bangzhu Wang.Evaluating the Thermostability of Metal Precursors in MOCVD by the Reaction Kinetic Analysis[J].Rare Metal Materials and Engineering,2019,48(12):3824~3828.]
反应动力学法评价MOCVD过程中金属有机盐的稳定性
投稿时间:2018-05-30  修订日期:2018-06-04
中文关键词:  YBCO  MOCVD  金属前驱盐  热稳定性  化学反应动力学
基金项目:国家重点研发计划(2017YFB0902302),国家自然科学基金(51477165),中央高校基本科研业务费专项资金(2017RC009)
中文摘要:
      在MOCVD技术中,金属前驱盐持续稳定蒸发是获得高质量YBa2Cu3O7-δ(YBCO)超导薄膜的关键。随着新型高挥发金属有机盐的不断涌现,亟需一种评价金属前驱盐在蒸发过程中稳定性的实用方法。本文基于MOCVD法制备YBCO超导体过程中常用的、具有不同蒸发特性的三种金属前驱盐(Y(DPM)3, Cu(DPM)2, Ba(DPM)2),采用非等温热重分析法对比研究三种金属前驱盐在蒸发过程中的热稳定性和分解动力学特性,并依据典型动力学方法(Ozawa, Kissinger和Friedman法)计算获得各金属前驱盐在蒸发过程中的表观活化能(Ea)及其变化规律,进而分析评价其在蒸发过程中的热稳定性。研究结果表明:Ba(DPM)2金属前驱盐在蒸发过程中会伴随发生热分解反应,且分解过程对温度变化敏感,而Y(DPM)3和Cu(DPM)2可以稳定蒸发。结合TGA-DSC分析证实,采用固相反应动力学方法来评价MOCVD过程中金属前驱盐的热稳定性是可靠的。
Evaluating the Thermostability of Metal Precursors in MOCVD by the Reaction Kinetic Analysis
英文关键词:YBCO  MOCVD  metal precursor  thermostability  reaction kinetic analysis
英文摘要:
      The sufficient and stable evaporation of metal precursors is crucial to obtain reproducible YBa2Cu3O7-δ (YBCO) film with high quality in MOCVD technique, and a practicalSSwaySis needed to evaluate the thermal stability of metal precursors in evaporation. In this work, the thermal properties and decomposition kinetics of three precursors with different evaporation characteristics (Y(DPM)3, Cu(DPM)2, Ba(DPM)2) were comparatively investigated by non-isothermal thermogravimetric analysis, and the apparent activation energy (Ea) of evaporation process was evaluated by the Ozawa, Kissinger and Friedman methods. The results show that the decomposition reaction of Ba(DPM)2 is indeed concomitant with its evaporation process and highly sensitive to the change of temperature. In addition, the consistent results from TGA-DSC and the kinetic analysis can also confirm that evaporation kinetics study is suitable for investigating the thermostability of metal-organic compound in MOCVD process.
作者单位E-mail
张腾 北京交通大学 tengzhang@bjtu.edu.cn 
戴少涛 北京交通大学 stdai@bjtu.edu.cn 
马韬 北京交通大学  
胡磊 北京交通大学  
王邦柱 北京交通大学  
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