陈杰,朱正吼,林前英,白茹茹,赵辉.Fe73.5Cu1Nb3Si13.5B9非晶合金薄膜压磁效应的特征及负压磁效应现象研究[J].稀有金属材料与工程,2020,49(4):1204~1210.[CHEN Jie,ZHU Zhenghou,LIN Qianying,BAI Ruru,ZHAO Hui.The Study on the Characteristics of Piezomagnetic Properties and the Phenomenon of Negative PiezomagneticEffect of Fe73.5Cu1Nb3Si13.5B9 Amorphous Alloy Films[J].Rare Metal Materials and Engineering,2020,49(4):1204~1210.]
Fe73.5Cu1Nb3Si13.5B9非晶合金薄膜压磁效应的特征及负压磁效应现象研究
投稿时间:2018-11-23  修订日期:2020-03-29
中文关键词:  非晶合金薄膜,压磁效应,内应力
基金项目:国家自然科学基金项目(面上项目,重点项目,重大项目)
中文摘要:
      本文以Fe73.5Cu1Nb3Si13.5B9非晶合金薄膜作为研究对象,研究了其压磁效应的特征及其负压磁效应现象。研究结果表明,淬态下的Fe73.5Cu1Nb3Si13.5B9非晶合金薄膜在0-0.6KPa压力带具有显著的正压磁效应,随着压应力增大,薄膜电感值下降。当压应力σ=0.6kPa时,压磁效应值Si%达到5.5%;环境温度对压磁效应灵敏度有影响,在20~30 ℃范围内,压磁效应和灵敏度稳定性最好,随着环境温度升高,薄膜灵敏度和压磁效应值均降低;薄膜经过退火处理后,薄膜内应力状态会发生变化,当退火温度≧350℃时,薄膜的压磁效应类型由“正压磁效应”转变为“负压磁效应”,且随着薄膜中内应力降低,|Si%|值下降,且薄膜的压磁效应受环境温度影响减小。当退火温度为555℃时,|Si%|值最小,σ=0.66kPa时,|Si%|值0.5%;当退火温度达到薄膜的晶化温度时,薄膜的压磁效应受环境温度影响最小。
The Study on the Characteristics of Piezomagnetic Properties and the Phenomenon of Negative PiezomagneticEffect of Fe73.5Cu1Nb3Si13.5B9 Amorphous Alloy Films
英文关键词:amorphous  alloy film, piezomagnetic  property, internal  stress
英文摘要:
      Herein we report an investigation of the piezomagnetic properties and the negative piezomagnetic effect in a Fe73.5Cu1Nb3Si13.5B9 amorphous alloy film. The results show that in its quenched state, the Fe73.5Cu1Nb3Si13.5B9 amorphous alloy film has a significant positive piezomagnetic property. Furthermore, the inductance of the alloy film decreases substantially in the 0–0.66 kPa pressure zone, whereas the compressive stress, σ, increases. At a σ value of 0.66 kPa, the piezomagnetic effect value, SI, reaches 5.5%; The ambient temperature has significant influence on the sensitivity of the piezomagnetic property. The films show optimal piezomagnetic properties and sensitivity stability in the temperature range of 20–30 °C. Increases in ambient temperature lead to increases in the piezomagnetic property and sensitivity values, and the inner stress state of the film changed after annealing treatment. At an annealing temperature of 350 °C, the piezomagnetic effect of the film changes from being "positive " to "negative." Furthermore, as the internal stress decreases, the value of |SI| decreases, and the piezomagnetic property of the film becomes less sensitive to changes in the ambient temperature. For an annealing temperature of 555 °C, the value of |SI| is minimum (0.59%), at a σ value of 0.44 kPa. When the annealing temperature reaches the crystallization temperature, the piezomagnetic property of the film becomes less sensitive to changes in the ambient temperature.
作者单位E-mail
陈杰 南昌大学 材料科学与工程学院 chenjiepaper@sina.com 
朱正吼 南昌大学 材料科学与工程学院  
林前英 南昌大学 材料科学与工程学院  
白茹茹 南昌大学 材料科学与工程学院  
赵辉 南昌大学 空间与技术研究院  
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