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深振荡磁控溅射制备柔性硬质纳米涂层的研究进展
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1.北京师范大学核科学与技术学院射线束技术教育部重点实验室;2.1;3.北京市辐射中心;4.西北核物理研究所;5.北京金轮坤天特种机械有限公司

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国家科技重大专项(2017-VII-0012-0107), 国家自然科学基金联合基金重点项目(U1865206), 广东省重点领域研发计划 (2019B090909002),2020年北科萌芽计划项目


Research progress of flexible hard coating deposited by deep oscillating magnetron sputtering
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    摘要:

    柔性硬质纳米涂层具有高致密性、高表面完整性、高硬度、高韧性和高裂纹抵抗力特性,是新一代高性能纳米涂层的一个重要发展方向,但其制备难度高,难以利用传统涂层制备技术实现。深振荡磁控溅射(Deep Oscillation Magnetron Sputtering, DOMS)技术是一种新型的高功率脉冲磁控溅射技术,现已成为国际涂层研究领域的热点。DOMS技术通过一系列调制的电压微脉冲振荡波形,能够实现完全消除电弧放电和靶材近全离化,获得高密度、低离子能量和高束流密度的等离子体,能制备出具有低缺陷、高表面完整性、高致密性的高性能纳米涂层,并且对纳米涂层的成分、结构和性能实现“剪裁化”的可控制备。本文综述了柔性硬质纳米涂层的特征以及DOMS制备柔性硬质纳米涂层的最新进展。

    Abstract:

    Flexible hard coatings with high density, high surface integrity and smooth surface morphology exhibit simultaneously high hardness, high toughness and high crack resistance which represent a new class of high-performance coatings. However, their depositions are a hard work. Deep oscillation magnetron sputtering (DOMS) is a novel high-power impulse magnetron sputtering, which become a hotspot in tribological hard coatings around world. Using a series of modulated micro-pulse of voltage oscillation, DOMS can achieve virtually arc-free high-power discharge to generate highly ionized target species to obtain high dense plasma with low ion energy and high ion flux. These features allow to prepare high-performance nanostructured coating, which can be modulated by composition, structure and properties using a series of micro-pulse under optimized deposition conditions. In this paper, we summarize characteristics of flexible hard nanostructured coatings and research progress in recent years of flexible hard nanostructured coatings deposited by DOMS technology.

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王浩琦,孙丽,欧伊翔,,金小越,张旭,华青松,庞盼,罗军,陈琳,廖斌,欧阳晓平,鲍曼雨.深振荡磁控溅射制备柔性硬质纳米涂层的研究进展[J].稀有金属材料与工程,2021,50(8):2993~3002.[Wang Haoqi, Sun Li, Ou Yixiang,,Jin Xiaoyue, Zhang Xu, Hua Qingsong, Pang Pan, Jun Luo, Chen Lin, Liao Bin, Ouyang Xiaoping, Bao Manyu. Research progress of flexible hard coating deposited by deep oscillating magnetron sputtering[J]. Rare Metal Materials and Engineering,2021,50(8):2993~3002.]
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历史
  • 收稿日期:2020-06-23
  • 最后修改日期:2020-09-17
  • 录用日期:2020-10-15
  • 在线发布日期: 2021-09-07
  • 出版日期: 2021-08-31