ZrCoRE (RE is rare earth elements) getter films have significant application in vacuum packaging of MEMS devices because of excellent gas adsorption performance, low activation temperature and no environmental pollution. The films are deposited by DC magnetron sputtering by argon and krypton gas by changing the deposition pressure. The effects of sputtering gas and pressure on the morphology and hydrogen adsorption performance of ZrCoRE films are investigated. Results show that the films prepared in Ar are relatively dense, and have less grain boundaries. The increase of Ar pressure resulted in more grain boundaries and gap structures in the films. Meanwhile, films deposited in Kr have more grain boundaries and clusters structures. The films had an obvious columnar crystal structure, and a lot of interfaces and gaps are distributed among the columnar structures, providing more paths for gas diffusion. With Kr pressure increases, the film contains more obvious continuous columnar structure growth, and grain boundaries spread deeper and wider. The structure has larger specific surface area, which is conducive to improve the hydrogen adsorption speed and capacity. Consequently, high Ar and Kr pressures are beneficial to improve the adsorption performance.