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Study on Particle Transport Near the Target Surface in Reactive Sputtering
Clc Number:

TN304.05

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    Abstract:

    The rate equations for particle produce, transport, and reaction with target surface, and sputtering peeling of ion and neutral particles with high energy are established. After these equations coupling up and taking account of other calculations, such as energy distribution functions, macroscopic flow velocity of gas, etc., the relation curves between sputtering rate and inlet flow of reaction gas for different discharge current are obtained. and the advantages of this analysis method are also discussed in the paper.

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[Tao Futing, Wang Jingyi, He Xiaoming, Wang Yu, Ying Sheng. Study on Particle Transport Near the Target Surface in Reactive Sputtering[J]. Rare Metal Materials and Engineering,2003,(2):99~102.]
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