Control of the Magnetic Film Composition and Uniformity in Magnetron Sputtering

Home > Archive>Volume 33, Issue 7, 2004 >775-777

Control of the Magnetic Film Composition and Uniformity in Magnetron Sputtering
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                        Zhu Yaomin1,2,Li Xiaoyuan1,Song Xiaoping1,Chen Qiang1Zhu Yaomin1,2,Li Xiaoyuan1,Song Xiaoping1,Chen Qiang1

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[Zhu Yaomin, Li Xiaoyuan, Song Xiaoping, Chen Qiang. Control of the Magnetic Film Composition and Uniformity in Magnetron Sputtering[J]. Rare Metal Materials and Engineering,2004,33(7):775~777.]
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