A Ni-5at%W ingot was prepared by a combination process of PM and remelting. Afterwards the ingot was swaged and drawn into wires which were finally cold-rolled into trips with 70 μm thickness. A recrystallization annealing for the substrate trip was carried out at different temperatures (800~1300 ℃) for different time (0~3 h). Cube texture in the substrate was evaluated by means of X-ray diffraction and electron back-scatter diffraction, meanwhile, the hardness of the substrate was characterized. It was found that the recrystallization process was almost completed below 800 ℃ and the fraction of cube texture did not obviously change upon annealing time prolonging for 1~3 h at 980 ℃. Strong cube texture was obtained after annealing at 1100 ℃ and 1300 ℃, and the surface area fraction of the grains orientated within 8° around ideal {001}<100> texture were about 93% and 99.8% of the total grains, respectively. After the substrate trip was annealed at and below 1300 ℃, its microstructure was uniform, no abnormal grain growth was found, and the cube texture exhibited good stability at high temperature. However, abnormal grain growth and other texture components appeared in the substrate trip after annealed at 1400 ℃.