The principle of chemical vapor deposition (CVD) tantalum was introduced through hydrogen reduction of tantalum chloride. The influences of chlorination temperatures, Cl2 flow, H2 flow and deposition temperatures on deposition rate and crystal structure were studied. The results show that the influence of chlorination temperatures on deposition rate is minimum, while that of deposition temperatures is maximum. Microstructure is composed of small grains and columnar grains. The columnar grain sizes change with deposition parameters