Using high purity W-Si alloy powder (> 99.995%) as raw material, high purity W-Si alloy target was prepared by vacuum hot pressing sintering process. The effects of process parameters, including sintering temperature, hot pressing pressure and holding time, on the target performance of density and microstructure were investigated. The results show that under the process parameters of sintering temperature of 1350~1380 oC, hot pressing pressure of 25~30 MPa, and holding time of 1.5~2 h, high performance W-Si alloy target could be prepared with more than 99% relative density and average grain size less than 100 μm.