The low ionization rate of magnetron sputtering ion plating and the micron-size droplet splash of multi-arc ion plating restrict the development of ion plating technique for a long time. According to the Joule heating effect which result in that the electron goes through the defect area with a relatively higher resistance value will increase the temperature of the defect area, and the thermionic emission from the metal surface with a high temperature, a new type of micro-arc ion plating technology based on the target material escaping from the target by the ion collisions and thermal emission is established. The temperature of target surface rose rapidly by the bombardment of Ar₊ and Joule heating effect, the kinetic energy of the target electrons and atoms increased to overcome surface work function to escape from the target surface. The increasing of atoms and electrons in the plasma improved the collision ionization rate of the target atoms, and the target surface did not appear obvious arc and avoided the melt splashing of target material, therefore the target atoms of the micro-arc ion plating could obtain a high ionization rate and a high density. The results showed that the TiN film deposited by micro-arc ion plating has dense microstructure, fine surface quality, high hardness, well film adhesion and strong corrosion resistance.