Growth kinetics of niobium coating prepared by CVD from NbF5
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Beijing Institute of Technology,Beijing Institute of Technology,Beijing Institute of Technology,Beijing Institute of Technology,China Astronaut Research and Training Center
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TG146.4+16
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Abstract:
:Dense niobium coating was successfully prepared by atmospheric pressure chemical vapor deposition(CVD) method at 1150℃ ,which reached 250μm / h deposition rate.Analysis the post-deposition coating thickness by the gas flow direction,the mole percentage of NbF5, H2, HF and Arin different positionsweredetermined.And got agrowthkinetics equation which agrees well with the experimental results .Further analysis of the kinetic equations showed that the byproduct HF has a greater impact on deposition rate and Ar almost no effect.
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[Zheng Mingmin, Tan Chengwen, Yu Xiaodong, Li Ying, Ma Honglei. Growth kinetics of niobium coating prepared by CVD from NbF5[J]. Rare Metal Materials and Engineering,2018,47(1):187~190.] DOI:[doi]