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Effect of substrate pulse bias voltage on the microstructure and mechanical and wear-resistant properties of TiN/Cu nanocomposite films
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1.Institute of Metal Research,Chinese Academy of Sciences;2.School of Mechanical and Electrical Engineering,Shenzhen Polytechnic;3.Institute of High Current Electronics,Siberian branch,Russian Academy of Sciences,Akademicheskii pr /

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TB43

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    Abstract:

    In this present work, TiN/Cu nanocomposite films were deposited by axial magnetic field-enhanced arc ion plating (AMFE-AIP) on high-speed steel (HSS) substrates, and the effect of substrate bias voltage on the chemical composition, microstructure, mechanical and tribological properties of the films were investigated by X-ray photoelectrons spectroscopy (XPS), X-ray diffraction (XRD), nanoindentation and wear measurements, respectively. The results showed that Cu content firstly increases and then decreases with the increase of the pulse bias voltage, being a low value in the range of 1.3 to 2.1 at.%. The XRD results showed all the films only appear TiN phase and no Cu phase is observed. And the preferred orientation for the films changes significantly with increasing the pulse bias voltage. The maximum value of hardness, 36 GPa is obtained with pulse bias voltage of -200V corresponding to the film containing approximately 1.6 at.% Cu. Compared to pure TiN film, Cu addition to TiN films significantly improves the wear resistance.

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[Yanhui Zhao, Shengsheng Zhao, Ling Ren, V. V. Denisov, N. N. Koval, Ke Yang, Baohai Yu. Effect of substrate pulse bias voltage on the microstructure and mechanical and wear-resistant properties of TiN/Cu nanocomposite films[J]. Rare Metal Materials and Engineering,2018,47(11):3284~3288.]
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History
  • Received:April 19,2017
  • Revised:August 21,2017
  • Adopted:September 11,2017
  • Online: December 19,2018
  • Published: