High power pulsed magnetron sputtering (HiPIMS) technology can be used to prepare high quality coatings with smooth surface and dense structure due to its high ionization rate and high ion energy. And the deposition temperature will determine the kinetic energy and diffusion ability of the deposited particles, which has a significant impact on the growth process and performance. In this paper, Al-Cr-Si-N coating is prepared by HiPIMS technology at different deposition temperatures. The effects of deposition temperature on the structure, composition, microstructure, mechanical properties and tribological properties of the coatings were systematically studied. The results show that as the deposition temperature rises from 100°C to 350°C, the interior of the coating begins to convert from amorphous to nanocrystals, and the FCC-AlN phase appears at 300°C. The smoothness and compactness of the coatings are progressively improved. The adhesion strength increase gradually, reached the maximum value of 83N at 300 °C and decreases to 18N at 350 °C due to the serious glow etching effect .The hardness of the coating increases gradually and reaches a maximum of 19 GPa at 350°C. No columnar crystals are found and the residual stress is low, and the inverse Hallpez effect occurs, due to the increase in kinetic energy of the deposited particles and the densification of the structure.