MoS₂ films wre prepared on A286 substrate by unipolar pulse magnetron sputtering. The morphology,microstructure and composition of the films were characterized by using scanning electron microscopy, X-ray diffractometer. The mechanical properties and tribological behavior in air of the films were investigated by using nano-indentation tester and ball-on-disc tribotester. This paper discusses effects of pulsed bias on microstructure, mechanical properties and tribological properties of MoS₂ Films. The results show that the preferential oriention of coatings changes from (002) to (100) in advance with the pulse bias voltage increasing from 300 V to 600 V. When the pulse bias voltage increasing to 800V, the preferential oriention renews to (002), and the film was of smooth and compact structure.With the pulse bias voltage increasing, the hardness and elastic modulus will decrease firstly and increase afterward. The friction coefficient fluctuated in the range of 0.065~0.076 and show the tendency of increasing firstly and decreasing afterward. When the bias voltage is 800 V, the property and performance of friction is the best. The wearing rate is only 13.5% of the substrate, It shows the lower friction coeffient and the good wearing resistance.