+Advanced Search
Nanocrystalline Ti films deposited by modulated pulsed power magnetron sputtering
Affiliation:

Xi''an University Of Technology

Clc Number:

TG43

  • Article
  • | |
  • Metrics
  • |
  • Reference [34]
  • |
  • Related
  • | | |
  • Comments
    Abstract:

    Modulated pulsed power magnetron sputtering (MPPMS) has the ability to control ionization rate, energy and quantity of the deposited particle through adjusting the pulsed intensity and duration, thus modifying the nucleation and growth process of the thin film. In this work, nanocrystalline Ti films are deposited by using MPPMS technique in a closed field unbalanced magnetron sputtering (CFUBMS) system under different peak target power densities of the strong-ionized period (Pd). The modulated pulse power (MPP) is employed to modify the Pd by varying pulse lengths and average target powers. The results show that a nanocrystalline Ti film with grain size of 11 nm exhibits a dense microstructure and smooth surface (roughness was 11 nm) when the Pd is 0.86 kW×cm-2. The improved properties of the as-prepared Ti film are discussed.

    Reference
    1Jeyachandran Y L, Karunagaran B, Narayandass S K et al. Materials Science and Engineering[J], 2006, 431(1): 277
    2Boyer R R. Materials Science and Engineering[J]. 1996, 213 (1-2): 103
    3Textor M, Sittig C, Frauchiger V et al. Titanium in Medicine[M], Springer-Verlag, Heidelberg, 2001, pp: 172
    4Li J X, Zhang H Q, Fan A et al. Surface and Coatings Techology[J], 2016, 294: 30
    5Kelly P J, Arnell R D. Vacuum[J], 2000, 56(3): 159
    6Lin J L, Moore J J, Sproul W D et al. Surface and Coatings Techology[J], 2010, 204(14): 2230
    7Mukherjee S, Gall D. Thin Solid Films[J], 2013, 527: 158
    8Lin J L, Moore J J, Sproul W D et al. Surface and Coatings Techology[J], 2009, 203(24): 3676
    9Petrov I, Barna P B, Hultman L et al. Journal of Vacuum Science and Technology A[J], 2003, 21(5): S117
    10Lin J L, Moore J J, Sproul W D et al. Thin Solid Films[J], 2009, 518(5): 1566
    11Yang C, Jiang B L, Liu Z et al. Surface and Coatings Techology[J], 2016, 304: 51
    12Martin P J, Netterfield R P, Bendavid A, et al. Surface and Coatings Techology[J], 1992, 54-55(9): 136
    13Liu T J. Engineering Fracture Mechanics[J]. 2014, 123: 2
    14Yang C, Jiang B L, Liu Z et al. Thin Solid Films[J], 2015, 597: 117
    15Yang C, Jiang B L, Feng L et al. Acta Metallurgica Sinica[J], 2015, 51: 1523
    16Posadowski W M. Thin Solid Films[J], 2001, 392(2): 201
    17Cullity B D, Stock S R. Elements of X-Ray Diffraction[M], 3rd. Ed, Prentice-Hall Inc., London, 2001, pp: 167
    18Jenkin R. Snyder R L. Introduction to X-Ray Diffractometry[M], John Wiley and Sons Inc., New York City, 1996, pp: 89
    19Chen A Y, Bu Y, Tang Y T et al. Thin Solid Films[J], 2015, 574 71
    20Tian M B, Li Z C. Thin Film Technologies and Materials[M], Tsinghua University Press, Beijing, 2011, pp: 135
    21Chawla V, Jayaganthan R, Chawla A R et al. Materials Chemistry Physics[J], 2008, 111(2-3): 414
    22Matthews A, Franklin S, Holmberg K. Journal of Physics D: Applied physics[J], 2007, 40(18): 5463
    23Sergueeva A V, Stolyarov V V, Valiev R Z et al. Scripta Materialia[J]. 2001,45(7): 747
    24Wang Y M, Ott R T, Buuren T V et al. Physics Review[J], 2012, 85(1): 120
    25Zhang Y J, Yang Y Z, Zhai Y H et al. Applied Surface Science[J], 2012, 258(18): 6897
    26Zhang P, Cai Z H, Xiong W Q. Surface and Coatings Technology[J], 2007, 201(15): 6819
    27Choi S R, Park I W, Kim S H et al. Thin Solid Films[J], 2004, 447(4): 371
    28Chawla V, Jayaganthan R, Chandra R. Surface and Coatings Technology[J], 2010, 204(9-10): 1582
    29Nia N S, Savall C, Creus J et al. Materials Science and Engineering[J], 2016, 678: 204
    30Stallard J, Poulat S, Teer D G. Tribology International[J], 2006, 39(2): 159
    31Lin J L, Moore J J, Mishra B et al. Surface and Coatings Technology[J], 2008, 202(8): 1418
    32Laing K, Hampshire J, Teer D. Surface and Coatings Technology[J], 1999, 112(1-3): 177
    33Heinke W, Leylan A, Matthews A et al. Thin Solid films[J], 1995, 270(1): 431
    34Inamdar S, Ramudu M, Raja M M. Journal of Magnetism and Magnetic Materials[J], 2016, 418: 175
    Related
    Cited by
Get Citation

[Yang Chao, Jiang Bailing, Wang Di, Huang Bei, Dong Dan. Nanocrystalline Ti films deposited by modulated pulsed power magnetron sputtering[J]. Rare Metal Materials and Engineering,2019,48(11):3433~3440.]
DOI:10.12442/j. issn.1002-185X.20180292

Copy
Article Metrics
  • Abstract:
  • PDF:
  • HTML:
  • Cited by:
History
  • Received:March 28,2018
  • Revised:October 18,2019
  • Adopted:April 26,2018
  • Online: December 10,2019