Modulated pulsed power magnetron sputtering (MPPMS) has the ability to control ionization rate, energy and quantity of the deposited particle through adjusting the pulsed intensity and duration, thus modifying the nucleation and growth process of the thin film. In this work, nanocrystalline Ti films are deposited by using MPPMS technique in a closed field unbalanced magnetron sputtering (CFUBMS) system under different peak target power densities of the strong-ionized period (Pd). The modulated pulse power (MPP) is employed to modify the Pd by varying pulse lengths and average target powers. The results show that a nanocrystalline Ti film with grain size of 11 nm exhibits a dense microstructure and smooth surface (roughness was 11 nm) when the Pd is 0.86 kW×cm-2. The improved properties of the as-prepared Ti film are discussed.