Maskless localized electrochemical deposition-additive manufacturing technology is a new technology for manufacturing three-dimensional micro metal structure by applying electrochemical depositing principles and additive manufacturing method without reliance on support or mask. The representiative techniques which embody the core content and process features of this new technology are reviewed in this paper: the basic principles and research progress of technology of maskless localized jet electrochemical deposition-additive manufacturing ( Maskless Jet ECD-AM ) and technology of maskless localized direct writing electrochemical deposition-additive manufacturing ( Maskless Direct Writing ECD-AM ). The characteristics, existing problems and future research development trends of the two technologies are analyzed.