The plating materials of arc ion plating leaved target by melt splash. It is easy to cause secondary tempering of the matrix because of micron sized particles on the coating surface. The ionization rateofmagnetron sputtering is low due to the leave-target mode of cascade collision. The deposition rate of high power pulsed magnetron sputtering is low due to the small duty cycle of pulse discharge. These defects seriously restrict the wide application of current mainstream coating deposition technology.Based on the physical knowledge of gas discharge plasma, a new type of stepped dual-stage pulsed electric field was used to initiate gas micro arc discharge between cathode target and anode chamber. With the help of the high density plasma produced by micro arc discharge, the kinetic energy of argon ion bombardment on the target surface and the Joule heat generated by the target surface are enhanced. The collision enhanced thermal emission of the plating material can be realized, and the ionization rate is increased, which provides the possibility for improving and regulating the coating structure. The results showed that the gas micro arc discharge induced by dual-stage pulsed electric field presents dazzling blue and white light. The surface morphology of the target surface after discharge showed the morphology of meteorite crater and water flow crater. The target surface morphology was not exactly the same as the undulating crater left after the collision sputtering of the plating material under DC electric field. The the plating material leaved target by collision sputtering and thermal emission. At the same time, the TiN coating prepared by the dual-stage pulsed electric field had a relatively compact structure, and the deposition rate reached 51 nm/min, which is significantly improved compared with the traditional high power pulsed magnetron sputtering.