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Direct CW-laser writing sub-diffraction-limit nanopore array based on the low one-photon absorption of polymer
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State Key Laboratory of Cultivation Base for Photoelectric Technology and Functional Materials, Laboratory of Optoelectronic Technology of Shaanxi Province, National Center for International Research of Photoelectric Technology & Nano-functional Materials and Application, Institute of Photonics and Photon-Technology, Northwest University, Xi’an 710069, China,,,State Key Laboratory of Cultivation Base for Photoelectric Technology and Functional Materials, Laboratory of Optoelectronic Technology of Shaanxi Province, National Center for International Research of Photoelectric Technology & Nano-functional Materials and Application, Institute of Photonics and Photon-Technology, Northwest University,,,,

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    Abstract:

    A large area nanopore array with controllable consistency has been successfully fabricated by direct laser writing (DLW) technique with ultralow one-photon absorption (LOPA). In this technique, a doughnut-shape beam generated by 532 nm continuous-wave laser through a vortex phase plate is focused into the thin film of SU8 photoresist by a high numerical aperture objective. The low absorption of the photoresist at the excitation wavelength allows controllable fabricating structures with sub-diffraction-limit feature size and high aspect ratio. With point-by-point scanning fabrication, nanopore array with the pore’s internal diameter, about ten per cent of incident laser wavelength, far smaller than Abbe’s diffraction limit is achieved. The influences of the exposure intensity and exposure time on the fabricated nanopore size and shape are also investigated by scanning electron microscope (SEM).

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[Lianbin Fan, Chen Zhang, Hongfu Li, Kaige Wang, Xiaoqiang Feng, Wei Zhao, Weichao Wang, Jintao Bai. Direct CW-laser writing sub-diffraction-limit nanopore array based on the low one-photon absorption of polymer[J]. Rare Metal Materials and Engineering,2018,47(1):75~81.]
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History
  • Received:January 13,2017
  • Revised:January 13,2017
  • Adopted:March 01,2017
  • Online: February 07,2018

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