Abstract
To investigate the effect of molybdenum (Mo) addition on microstructure and oxidation resistance of CrN coating, Cr-Mo-N coatings with different Mo contents were fabricated on silicon wafers and high speed steel by reactive magnetron sputtering and annealed at elevated temperatures from 500 °C to 800 °C in air for 1 h. The coatings before and after annealing were characterized by X-ray diffraction (XRD), Raman spectroscopy and scanning electron microscope (SEM). The results show that the as-deposited CrN and Cr-Mo-N coatings all exhibit B1 face-centered cubic (fcc) phase based on the CrN lattice. Mo ions substitute for Cr ions in Cr-N lattice, forming the solid solution Cr-Mo-N coatings. At 600 °C, XRD and Raman spectra show that the MoO3 phase forms in Cr-Mo-N coatings with higher Mo contents, indicating a coarser surface with higher oxygen content. At 700 °C, the cross sectional morphology of the CrN coating exhibits loose columnar grains with some porous regions due to the internal stress while the Cr-Mo-N coating shows the dense columnar structure. This study reveals that the Cr-Mo-N coatings with lower Mo contents (<17at%) have better oxidation resistance than the CrN coating does.
Science Press


Transition metal nitride coatings are widely used in cutting tools in order to reduce the tool cost and extend the tool life for past decade
CrN coating is a promising hard coating material due to its high hardness, excellent wear and oxidation resistance at about 700 °
The purposes of this research are to synthesize Cr-Mo-N coatings and show the influence of molybdenum addition on the structure and oxidation resistance of CrN films at high temperature.
Cr-Mo-N coatings were deposited on the polished high speed steel (HSS) substrates and silicon wafers by reactive magnetron sputtering in a mixture atmosphere of argon and nitrogen with the purity of 99.999% for both gases. Details of the deposition apparatus were presented in the previous wor
Crystal structure of the Cr-Mo-N coatings before and after oxidation was characterized by X-ray diffraction (XRD, D/MAX-RA of Rigaku, Japan) with monochromatic Cu Kα (λ=0.154 056 nm).
peaks by Debye-Scherrer equation. Scanning electron microscope (SEM, S-3400N, Hitachi, Japan) was used to observe the surface and cross-sectional morphologies and obtain structure and thickness information of the coatings. Energy dispersive spectroscope (EDS) coupled with the SEM was used to analyze the chemical composition of coatings. The formed ox-
ides were investigated by Raman spectroscopy using a Jobin-Yvon Raman spectrometer. The excitation source was a 532 nm laser (50 mW power).

The chemical composition of Cr-Mo-N coatings (measured by EDS) is listed in

Fig.2 Cross-sectional morphologies of Cr-Mo-N coatings with different Mo contents: (a) CrN, (b) Cr-Mo-N-1, (c) Cr-Mo-N-2, (d) Cr-Mo- N-3, (e) Cr-Mo-N-4, and (f) Cr-Mo-N-5

Fig.6 SEM images of surface morphology of Cr-Mo-N coatings on HSS with different Mo contents after annealing at 600 °C in air for 1 h: (a) CrN, (b) Cr-Mo-N-1, (c) Cr-Mo-N-2, (d) Cr-Mo-N-3, (e) Cr-Mo-N-4, and (f) Cr-Mo-N-5

Fig.9 SEM images of surface (a~c) and cross-section (d~f) morphologies of CrN coatings on Si substrates before and after annealing in air at different temperatures for 1 h: (a, d) as-deposited, (b, e) 700 °C, and (c, f) 800 °C

Fig.10 SEM images of surface (a~c) and cross-section (d~f) morphologies of Cr-Mo-N-3 coatings on Si substrates before and after annealing in air at different temperatures for 1 h: (a, d) as-deposited, (b, e) 700 °C, and (c, f) 800 °C
The SEM images of the cross-sectional morphologies of Cr-Mo-N coatings with different Mo contents are shown in

Fig.3 illustrates the XRD patterns of the Cr-Mo-N coatings with different Mo contents after annealing at 600 °C in air for 1 h. The JCPDS cards used in this study are 85-1336 (Cr), 76-2494 (CrN), 38-1479 (Cr2O3) and 35-0609 (MoO3). It can be seen that the diffraction peaks of fcc structure are well maintained in the Cr-Mo-N coatings with different Mo contents (Fig.3a). Besides, the weak (012) and (104) peaks of Cr2O3 can be identified in the CrN coating and the weak MoO3 peaks can be detected in the Cr-Mo-N-5 coating (Fig.3b). The reason for the appearance of MoO3 phase is that a small amount of Mo2N phases form in the Cr-Mo-N coatings with higher Mo contents, which are easily oxidized. The diffraction peaks of molybdenum or chromium oxides cannot be found in XRD patterns of other Cr-Mo-N coatings with lower molybdenum contents, indicating that their oxidation resistance is better than that of CrN and Cr-Mo-N coatings with higher molybdenum contents at 600 °C.
The structure of oxides is often analyzed by Raman spectroscopy. Fig.4 presents Raman spectra of the Cr-Mo-N coatings after annealing at 600 °C in air for 1 h. The Raman spectra of the Cr-Mo-N-4 and Cr-Mo-N-5 coatings exhibit typical peaks centered at 905 and 773 c

Oxygen content of the Cr-Mo-N coatings with different Mo contents (measured by EDS) is shown in Fig.5. The oxygen content of Cr-Mo-N coatings with lower Mo contents is around 10at%. The oxygen content of the Cr-Mo-N coatings increases sharply with increasing the Mo contents. These results show that the addition of low Mo contents improves the oxidation resistance of the CrN coatings, while the high Mo contents obviously weakens the coating oxidation resistance.

The XRD patterns of the CrN coatings before and after annealing from 500 °C to 800 °C are presented in Fig.7. C-CrN (111), (200) and (220) peaks are thermally stable at 600 °C. The diffraction peaks of the as-deposited CrN coating located at 36.81°, 43.11° and 62.53° are CrN (111), CrN (200) and CrN (220), respectively, which shift toward lower angles according to JCPDF No.76-2494. The reason for the peak shift is the residual compressive stress in the as-deposited CrN coating. The diffraction peaks shift to higher angles with the increase of annealing temperature, which implies the stress relaxation for the CrN coating during heat treatmen


For Cr-Mo-N-3 coating, fcc phases are well maintained at 700 °C, as shown in Fig.8. With the increase of annealing temperature, the (111) peak intensity increases while the (200) peak intensity decreases and the diffraction peaks shift to higher angles. The variation of the diffraction peak is attributed to the stress relaxation. At 800 °C, (012), (104) and (024) peaks of Cr2O3 appear in the Cr-Mo-N-3 coating.
The Mo-oxides are not observed in the XRD patterns at test temperatures for the following reasons: (1) Cr2O3-based oxide containing molybdenum forms; (2) even if a small amount of Mo-oxides form, the volatilization reaction rate is higher than the oxidation reaction rate above 550 °
The SEM images of surface and cross-section morphologies of CrN coatings on Si substrates before and after annealing in air at different temperatures for 1 h are demonstrated in
1) The as-deposited CrN and Cr-Mo-N coatings all show a single phase fcc structure with a preferential growth along (200). The coatings with the lower deposition rate show a typical columnar structure.
2) After annealing at 600 °C in air for 1 h, the XRD and Raman results illustrate that Cr2O3 and MoO3 phases appear in CrN and CrMoN coatings with high Mo content. The CrMoN coatings with relatively low Mo contents exhibit a smoother fine-grained morphology. The CrMoN coatings with relatively high Mo contents show a coarser surface with higher oxygen content.
3) After annealing at 700 °C in air for 1 h, the cross sectional morphology of the CrN coating exhibits loose columnar grains with some porous regions due to the internal stress, while the CrMoN coating shows dense columnar structure. After annealing at 800 °C in air for 1 h, the CrN coating basically exfoliates while some of the initial CrMoN coating remains.
4) The CrMoN coatings with lower molybdenum contents (<17at%) show better oxidation resistance than the CrN coating does. However, over doping of Mo has a detrimental effect on oxidation resistance of the coatings.
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