Using pulsed DC plasma chemical vapor deposition technology, the Ti(C, N) films on H13 steel were prepared under different CH4 atmospheres. The cross-sections of the Ti(C,N) films were investigated by SEM, and the elements in the film were characterized by XRD and XPS .The results show that addition of C to TiN film prevents the growth of TiN grains and development of column structure. The Ti(C, N) can be composed of two phases of TiN and phase TiC.