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Structure and Properties of Ti-Si-N Nanocomposite Films Prepared by Pulsed-DC Plasma Enhanced CVD
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TG174.44

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[Niu Xinping, Ma Dayan, Ma Shengli, Xu Kewei. Structure and Properties of Ti-Si-N Nanocomposite Films Prepared by Pulsed-DC Plasma Enhanced CVD[J]. Rare Metal Materials and Engineering,2005,34(11):1751~1753.]
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  • Received:December 10,2003
  • Revised:June 03,2005
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