Recent Progress in Preparation of Ta2O5 Film by CVD Using Ta(OC2H5)5 as Precursor
DOI:
Author:
Affiliation:
Clc Number:
TG154.5
Fund Project:
Article
|
Figures
|
Metrics
|
Reference
|
Related
|
Cited by
|
Materials
|
Comments
Abstract:
Reference
Related
Cited by
Get Citation
[. Recent Progress in Preparation of Ta2O5 Film by CVD Using Ta(OC2H5)5 as Precursor[J]. Rare Metal Materials and Engineering,2007,36(12):2075~2079.] DOI：[doi]