Pure Zr metal film was deposited on the surface of NiTi shape memory alloy by balanced magnetron DC sputtering and the microstructure of the Zr film was investigated by SEM, XRD and XPS methods. It is found that the Zr film has the T-type crystal band structure with a fine and dense fibre character. There are no pores and prick form. The film has good combination with NiTi substrate and a flatness surface. The crystal structure of the film is identical with its bulk Zr target except for a little bioinert ZrO2 phase. Finally the depositing mechanism of the Zr film by magnetron sputtering is discussed.