+Advanced Search
Sputtering Parameters and Properties of Mo Bilayer Thin Films
DOI:
Author:
Affiliation:

Clc Number:

Fund Project:

  • Article
  • |
  • Figures
  • |
  • Metrics
  • |
  • Reference
  • |
  • Related
  • |
  • Cited by
  • |
  • Materials
  • |
  • Comments
    Abstract:

    Molybdenum (Mo) bilayer thin films were deposited on soda-lime glass using DC magnetron sputtering process. The structure, morphology, and electrical properties of Mo films have been studied by XRD, SEM, four-probe tester, etc. The results show that all bilayer films exhibit a body-centered cubic structure. The buffer layer with rough surface and many defects is initially made on the substrate, whose R-T relationship reflects the characteristics of the semiconductor. The resistivity of the thin film decreases with the top layer’s deposition time increasing. In addition, the R-T relationship of these films shows a metal feature. Compared with the monolayer film, bilayer films have lower resistivity and shorter sputtering time, so it greatly satisfies the requirement of CIGS solar cell back electrode.

    Reference
    Related
    Cited by
Get Citation

[Zhang Yanxia, Yan Yong, Li Shasha, Huang Tao, Liu Lian, Zhang Yong, Zhao Yong, Yu Zhou. Sputtering Parameters and Properties of Mo Bilayer Thin Films[J]. Rare Metal Materials and Engineering,2013,42(10):2107~2111.]
DOI:[doi]

Copy
Article Metrics
  • Abstract:
  • PDF:
  • HTML:
  • Cited by:
History
  • Received:October 12,2012
  • Revised:
  • Adopted:
  • Online:
  • Published: