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郑明珉,谭成文,于晓东,李颖,马红磊.NbF5前驱体化学气相沉积铌涂层的生长动力学[J].稀有金属材料与工程(英文),2018,47(1):187~190.[Zheng Mingmin,Tan Chengwen,Yu Xiaodong,Li Ying,Ma Honglei.Growth kinetics of niobium coating prepared by CVD from NbF5[J].Rare Metal Materials and Engineering,2018,47(1):187~190.]
Growth kinetics of niobium coating prepared by CVD from NbF5
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Received:November 11, 2015  Revised:May 17, 2016
Key words: Niobium  coating, chemical  vapor deposition, growth  kinetics, byproducts
Foundation item:国家自然科学基金(51071099; 51171101);上海市教委科研创新基金(13YZ015)
Author NameAffiliationE-mail
Zheng Mingmin Beijing Institute of Technology 15210619204@163.com 
Tan Chengwen Beijing Institute of Technology  
Yu Xiaodong Beijing Institute of Technology yuxiaodong.bit@163.com 
Li Ying Beijing Institute of Technology  
Ma Honglei China Astronaut Research and Training Center  
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      :Dense niobium coating was successfully prepared by atmospheric pressure chemical vapor deposition(CVD) method at 1150,which reached 250μm / h deposition rate. Analysis the post-deposition coating thickness by the gas flow direction,the mole percentage of NbF5, H2, HF and Arin different positionsweredetermined. And got agrowthkinetics equation which agrees well with the experimental results . Further analysis of the kinetic equations showed that the byproduct HF has a greater impact on deposition rate and Ar almost no effect.