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Growth kinetics of niobium coating prepared by CVD from NbF5
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Beijing Institute of Technology,Beijing Institute of Technology,Beijing Institute of Technology,Beijing Institute of Technology,China Astronaut Research and Training Center

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TG146.4+16

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    Abstract:

    :Dense niobium coating was successfully prepared by atmospheric pressure chemical vapor deposition(CVD) method at 1150,which reached 250μm / h deposition rate. Analysis the post-deposition coating thickness by the gas flow direction,the mole percentage of NbF5, H2, HF and Arin different positionsweredetermined. And got agrowthkinetics equation which agrees well with the experimental results . Further analysis of the kinetic equations showed that the byproduct HF has a greater impact on deposition rate and Ar almost no effect.

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[Zheng Mingmin, Tan Chengwen, Yu Xiaodong, Li Ying, Ma Honglei. Growth kinetics of niobium coating prepared by CVD from NbF5[J]. Rare Metal Materials and Engineering,2018,47(1):187~190.]
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History
  • Received:November 11,2015
  • Revised:May 17,2016
  • Adopted:June 12,2016
  • Online: February 07,2018
  • Published: