The volt-ampere characteristics of gas discharge was introduced into the glow-arc discharge transitional section using adjustable pulse power control mode and deposited TiN films under different target current density conditions.The influence of target current density on the microstructure, hardness and bonding strength of the films was studied by means of XRD, SEM, TEM, nano indentation tester and coating adhesion automatic scratch tester. The results showed that plating material particles leave-target mechanism transformed form collide leave-target in sputtering condition to collide enhance heat emission leave-target and the deposition particles had a higher density, high ionization and high energy with the increase of target current density. The films have better surface quality and density degree, and the hardness and membrane-binding strength were upgraded from 13.4GPa、10.5N to 24.7GPa、16.8N respectively.