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刘际伟,高毅,刘洋.等离子体循环刻蚀镀膜提高锆膜的水汽阻隔性[J].稀有金属材料与工程(英文),2018,47(6):1916~1920.[Liu Jiwei,Gao Yi and Liu Yang.Improvement of vapor barrier property of zirconium film by plasma cyclic etching coating[J].Rare Metal Materials and Engineering,2018,47(6):1916~1920.]
Improvement of vapor barrier property of zirconium film by plasma cyclic etching coating
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Received:May 13, 2016  Revised:July 23, 2016
DOI:
Key words: Zirconium film  plasma etching  amorphization  water vapor barrier
Foundation item:国家自然科学基金资助(项目号11505145)
Author NameAffiliation
Liu Jiwei,Gao Yi and Liu Yang  
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Abstract:
      In order to improve the water vapor barrier property of zirconium film adhered to rigid polyurethane foam plastic, a method of the combination of plasma cycle etching and middle frequency magnetron sputtering technologies is proposed by changing the growth mode of zirconium grains. The grain on the surface of the zirconium film exhibits a trend of non crystallization after plasma cycle etching. A kind of normal columnar crystals is found in the cross sectional morphology for the non-etched sample, but a hybrid of columnar crystal and small groups of spherocrystal is observed for the etched sample. Finally, the water vapor barrier properties of zirconium film can be improved by the ion source cyclic etching. The normal columnar crystal growth of the zirconium film is inhibited by the cyclic etching, making the grain more refined, and the film shows a trend of non crystallization, which is regarded as the fundamental reason for the increase of compactness and improvement of water vapor barrier property.