A series of TiN films were prepared by high power pulse sputtering with different pulse width parameter, and the morphology, growth pattern and mechanical properties were studied by XRD, SEM, AFM and other means of the films. The result shows that the instantaneous deposition rate of TiN films increase, the crystalline degree increases gradually, and the grain size of the films increases with the increasing of pulse width. The micro morphology shows typical triangular cone and columnar growth of TiN(111) crystal orientation. Both particle size and surface roughness increase during the increasing of pulse width. No obvious pores and significant defects exist in the films. In mechanical properties, the analysis of H\E value shows that the films have better comprehensive properties, higher coating hardness and larger Hardness modulus ratio under the condition of small pulse width.