Quick Search:       Advanced Search
乔泳彭,蒋百灵,丁郁航,张静.基于脉宽参量的TiN纳米晶薄膜制备及性能研究[J].稀有金属材料与工程(英文),2019,47(3):916~922.[Qiao Yongpeng,Jiang Bailing,Ding Yuhang and Zhang Jing.Study on preparation and properties of TiN nanocrystalline films based on pulse width parameter[J].Rare Metal Materials and Engineering,2019,47(3):916~922.]
Study on preparation and properties of TiN nanocrystalline films based on pulse width parameter
Download Pdf  View/Add Comment  Download reader
Received:July 18, 2017  Revised:September 18, 2017
DOI:
Key words: pulse width parameter  nano-crystalline TiN films  microstructure  mechanical properties
Foundation item:国家自然科学基金资助(项目号52171144)
Author NameAffiliation
Qiao Yongpeng,Jiang Bailing,Ding Yuhang and Zhang Jing  
Hits: 6
Download times: 3
Abstract:
      A series of TiN films were prepared by high power pulse sputtering with different pulse width parameter, and the morphology, growth pattern and mechanical properties were studied by XRD, SEM, AFM and other means of the films. The result shows that the instantaneous deposition rate of TiN films increase, the crystalline degree increases gradually, and the grain size of the films increases with the increasing of pulse width. The micro morphology shows typical triangular cone and columnar growth of TiN(111) crystal orientation. Both particle size and surface roughness increase during the increasing of pulse width. No obvious pores and significant defects exist in the films. In mechanical properties, the analysis of H\E value shows that the films have better comprehensive properties, higher coating hardness and larger Hardness modulus ratio under the condition of small pulse width.