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Characterization of N+C,Ti+N and Ti+C ion implantation into Ti6Al4V alloy
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Science and Technology on Vacuum Technology and Physical Laboratory,Lanzhou Institute of Physics

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    Abstract:

    In this paper, TiN and TiC films were prepared on Ti6Al4V substrates by plasma based ion implantation. The effect of N+C and Ti+N hybrid ion implantation at 50 kV, and Ti+C ion implantation at 20 kV, 35 kV and 50 kV on mechanical properties was studied. The implantation was up to 2×1017 ions/cm2 fluence. XPS and XRD were used to characterize the modified surface of the implanted samples. It was found that the modified layer of Ti+C implanted at 50 kV was TiC and Ti-O bond and the layer of Ti+N implanted at 50 kV was TiN and Ti-O bond. The nano-hardness and the friction coefficient were measured by nano-indentation measurements and pin-on-disc-test. Hardness tests have shown that the hardness increased with N+C, Ti+N and Ti+C ion implantation. For Ti+C implanted samples, the hardness was increased with increasing negative voltage. The sample of implanted with Ti+C at 50 kV exhibited the highest hardness of 11.2 GPa. The results of wear tests showed that both Ti+C and Ti+N ion implanted samples had much better wear resistance compared un-implanted sample. The wear rate of Ti+C implanted at 50 kV sample was 6.7×10-5mm3/N.m, which was decreased over one order than un-implanted sample.

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[Feng Xingguo, Zhang Kaifeng, Zhou Hui, Zheng Yugang, Wan Zhihua. Characterization of N+C, Ti+N and Ti+C ion implantation into Ti6Al4V alloy[J]. Rare Metal Materials and Engineering,2019,48(5):1447~1453.]
DOI:10.12442/j. issn.1002-185X.20171189

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History
  • Received:December 24,2017
  • Revised:March 05,2018
  • Adopted:April 04,2018
  • Online: June 04,2019