Quick Search:       Advanced Search
郝娟,杨超,蒋百灵,杜玉洲,王戎,王旭,周克崧.不同磁控溅射工艺对纳米晶TiN薄膜微观结构与力学性能的影响[J].稀有金属材料与工程(英文),2021,50(8):2715~2720.[Hao Juan,Yang Chao,Jiang Bailing,Du Yuzhou,Wang Rong,Wang Xu and Zhou Kesong.Effects of Magnetron Sputtering Techniques on Microstruc-ture and Mechanical Properties of Nanocrystalline TiN Films[J].Rare Metal Materials and Engineering,2021,50(8):2715~2720.]
Effects of Magnetron Sputtering Techniques on Microstruc-ture and Mechanical Properties of Nanocrystalline TiN Films
Download Pdf  View/Add Comment  Download reader
Received:July 13, 2020  
DOI:
Key words: MPPMS  TiN films  microstructure  deposition rate
Foundation item:51271144/51571114
Author NameAffiliation
Hao Juan,Yang Chao,Jiang Bailing,Du Yuzhou,Wang Rong,Wang Xu and Zhou Kesong  
Hits: 11
Download times: 0
Abstract:
      The structure and properties of nanocrystalline TiN films deposited by direct current magnetron sputtering (dcMS), high power pulsed magnetron sputtering (HPPMS) and modulated pulsed power magnetron sputtering (MPPMS) were compared. Results show that columnar structure with a few gaps is obtained through dcMS because of low ionization rate and low kinetic energy of sputtered species, which results in poor mechanical properties; the deposition rate is 51 nm/min. The TiN film deposited by HPPMS exhibits dense structure and smooth surface, which is because HPPMS can improve ionization rate of sputtered species under the conditions of high peak target power and low duty cycle. The mechanical properties are improved, but the average deposition rate is relatively low, only 25 nm/min. MPPMS has the capability to modulate peak target power and duty cycle to achieve high ionization degree and deposition rate. Thus, the TiN film deposited by MPPMS shows dense columnar structure, smooth surface, superior mechanical properties and enhanced deposition rate of 45 nm/min.