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范连斌,张琛,李红福,王凯歌,冯晓强,赵伟,王伟超,白晋涛.基于聚合物低单光子吸收连续激光直写技术研制亚衍射极限纳米孔阵列[J].稀有金属材料与工程(英文),2018,47(1):75~81.[Lianbin Fan,Chen Zhang,Hongfu Li,Kaige Wang,Xiaoqiang Feng,Wei Zhao,Weichao Wang and Jintao Bai.Direct CW-laser writing sub-diffraction-limit nanopore array based on the low one-photon absorption of polymer[J].Rare Metal Materials and Engineering,2018,47(1):75~81.]
Direct CW-laser writing sub-diffraction-limit nanopore array based on the low one-photon absorption of polymer
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Received:January 13, 2017  Revised:January 13, 2017
DOI:
Key words: Nanopore, Direct laser writing, Ultralow one-photon absorption, Doughnut-shaped beam
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Lianbin Fan,Chen Zhang,Hongfu Li,Kaige Wang,Xiaoqiang Feng,Wei Zhao,Weichao Wang and Jintao Bai  
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Abstract:
      A large area nanopore array with controllable consistency has been successfully fabricated by direct laser writing (DLW) technique with ultralow one-photon absorption (LOPA). In this technique, a doughnut-shape beam generated by 532 nm continuous-wave laser through a vortex phase plate is focused into the thin film of SU8 photoresist by a high numerical aperture objective. The low absorption of the photoresist at the excitation wavelength allows controllable fabricating structures with sub-diffraction-limit feature size and high aspect ratio. With point-by-point scanning fabrication, nanopore array with the pore’s internal diameter, about ten per cent of incident laser wavelength, far smaller than Abbe’s diffraction limit is achieved. The influences of the exposure intensity and exposure time on the fabricated nanopore size and shape are also investigated by scanning electron microscope (SEM).