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范连斌,张琛,李红福,王凯歌,冯晓强,赵伟,王伟超,白晋涛.基于聚合物低单光子吸收连续激光直写技术研制亚衍射极限纳米孔阵列[J].稀有金属材料与工程(英文),2018,47(1):75~81.[Lianbin Fan,Chen Zhang,Hongfu Li,Kaige Wang,Xiaoqiang Feng,Wei Zhao,Weichao Wang,Jintao Bai.Direct CW-laser writing sub-diffraction-limit nanopore array based on the low one-photon absorption of polymer[J].Rare Metal Materials and Engineering,2018,47(1):75~81.]
Direct CW-laser writing sub-diffraction-limit nanopore array based on the low one-photon absorption of polymer
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Received:January 13, 2017  Revised:January 13, 2017
DOI:
Key words: Nanopore, Direct laser writing, Ultralow one-photon absorption, Doughnut-shaped beam
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Author NameAffiliationE-mail
Lianbin Fan State Key Laboratory of Cultivation Base for Photoelectric Technology and Functional Materials, Laboratory of Optoelectronic Technology of Shaanxi Province, National Center for International Research of Photoelectric Technology & Nano-functional Materials and Application, Institute of Photonics and Photon-Technology, Northwest University, Xi’an 710069, China 2356021208@qq.com 
Chen Zhang 1.陕西省光电子技术与功能材料重点实验室陕西省光电子技术重点实验室国家级光电子技术与功能材料及应用国际科技基地 西北大学光子学与光子技术研究所  
Hongfu Li 1.陕西省光电子技术与功能材料重点实验室陕西省光电子技术重点实验室国家级光电子技术与功能材料及应用国际科技基地 西北大学光子学与光子技术研究所
3. 昆明物理研究所 
 
Kaige Wang State Key Laboratory of Cultivation Base for Photoelectric Technology and Functional Materials, Laboratory of Optoelectronic Technology of Shaanxi Province, National Center for International Research of Photoelectric Technology & Nano-functional Materials and Application, Institute of Photonics and Photon-Technology, Northwest University wangkg@nwu.edu.cn 
Xiaoqiang Feng 1.陕西省光电子技术与功能材料重点实验室陕西省光电子技术重点实验室国家级光电子技术与功能材料及应用国际科技基地 西北大学光子学与光子技术研究所  
Wei Zhao 1.陕西省光电子技术与功能材料重点实验室陕西省光电子技术重点实验室国家级光电子技术与功能材料及应用国际科技基地 西北大学光子学与光子技术研究所  
Weichao Wang 1.陕西省光电子技术与功能材料重点实验室陕西省光电子技术重点实验室国家级光电子技术与功能材料及应用国际科技基地 西北大学光子学与光子技术研究所  
Jintao Bai 1.陕西省光电子技术与功能材料重点实验室陕西省光电子技术重点实验室国家级光电子技术与功能材料及应用国际科技基地 西北大学光子学与光子技术研究所
2.西北大学物理学院 
 
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Abstract:
      A large area nanopore array with controllable consistency has been successfully fabricated by direct laser writing (DLW) technique with ultralow one-photon absorption (LOPA). In this technique, a doughnut-shape beam generated by 532 nm continuous-wave laser through a vortex phase plate is focused into the thin film of SU8 photoresist by a high numerical aperture objective. The low absorption of the photoresist at the excitation wavelength allows controllable fabricating structures with sub-diffraction-limit feature size and high aspect ratio. With point-by-point scanning fabrication, nanopore array with the pore’s internal diameter, about ten per cent of incident laser wavelength, far smaller than Abbe’s diffraction limit is achieved. The influences of the exposure intensity and exposure time on the fabricated nanopore size and shape are also investigated by scanning electron microscope (SEM).